By smart integration of plasma emission monitoring (PEM) in the Cryosoft3 control software we can control stoichiometry and optimise deposition rate in reactive processes. PEM delivers a fast dynamic in-situ feedback to our control system which quickly and precisely regulates deposition parameters to ensure optimum conditions.

Besides being a very useful tool for pre-process, vacuum control, and fault diagnostics, the RGA can be used for controlling reactive processes. With a fast in-situ dynamic feedback loop we accurately control the partial pressure of the reactive gases to regulate the gas flow. No need to state that it is naturally fully integrated into the Cryosoft3 control software.