TORNADO COMPACT LAB

TORNADO COMPACT LAB

TORNADO COMPACT LAB

Tornado Compact LAB is a compact deposition system – a real lab workhorse, and due to the easy access, easy operation, and high process repeatability, it is a preferred tool for both the young student and the experienced scientist.

The system is available with evaporation or sputtering sources. It is a versatile entry level deposition system with fully automated process control and data logging with Cryosoft3 HMI. Available with manual load lock for even faster processing. Application examples involve general thin film R&D, photovoltaic materials, multilayer ohmic contacts, oxide and nitride coatings, graded cermet layers, metal coatings for electrodes, and hydrophobic or hydrophilic ceramic layers.

MAIN FEATURES

TORNADO SPUTTERING

Up to five 2-3” magnetrons
Up to three 4” magnetrons
Supports DC, pDC, RF, and HiPIMS sputtering
Single target or multi target co-deposition

Tornado Evaporation

Metallisation
Lift-off processes
Optionally combined with thermal evaporator
E-beam and thermal evaporation

SINGLE SUBSTRATE STAGE

Continuous 360° or indexed rotation
Backside resistive heating up to 400°C
Water cooled substrate stage with tilt (+/-45deg)
Single substrate load lock
Typical substrate size up to 4” (100mm)
RF/DC Bias feeding

Batch substrate fixture

Max diameter 300mm
Wafer capacity: 8×3” (76,2mm), 5×4” (100mm)
RF/DC Bias feeding

Interested in the Tornado Compact LAB for your R&D projects?
Contact us for a technical and dedicated discussion regarding your needs,
or download our brochure on the Tornado Platform to read more!

Brochure

Webbureau ITTP

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