The Flextura Sputter modules can be equipped with single or multiple magnetrons for direct planar or confocal sputtering. Whether you need standard metallisation or complex reactive sputtering processes – we have the experience to guide you towards the best solution.
The Flextura Sputter module enables high quality and high uniformity layers of metals and dielectrics. The systems can support up to 200mm wafers and can be configured with several RF and/or DC magnetron sources in several system configurations like planar or confocal sputtering.
You can run the Flextura module as a batch system, with a single substrate load lock, or plug it into our Flextura Cluster platform. In other words, you can start from a highly flexible standalone system, and later add additional processes and analytics to bring your thin film research to new heights. Save valuable clean room space and automate your deposition processes without compromising flexibility.
Prefer independent deposition systems, then the Flextura PVD module in combination with a single substrate load lock is a great versatile high quality tool.