TORNADO COMPACT LAB
Tornado Compact LAB is a compact deposition system – a real lab workhorse, and due to the easy access, easy operation, and the high process repeatability, it is a preferred tool for both the young student, and the experienced scientist.
Tornado 405 Sputtering
- Up to 5 pcs 2-3” magnetrons
- Up to 3 pcs 4” magnetrons
- DC, pDC, RF, HiPIMS
- Single target or multi target co-deposition
Tornado 405 Thermal Evaporator
- Five thermal evaporators (flexible boat size)
- Two power supplies for sequential or co-evaporation
Tornado 306 Ebeam
- Metallization
- Lift-off processes
- Optionally combined with thermal evaporator
Single substrate stage
- Continuous 360° or indexed rotation
- Backside resistive heating up to 400°C
- Water cooled substrate stage with tilt (+/-45deg)
- Single substrate load lock
- Typical substrate size up to 4” (100mm)
- RF/DC Bias feeding
Batch substrate fixture
- Max diameter 300mm
- Wafer capacity: 8×3” (76,2mm), 5×4” (100mm)
- RF/DC Bias feeding
Application examples
- General thin film R&D
- Photovoltaic
- Multilayer ohmic contacts
- Oxide and nitride coatings
- Graded cermet layers
- Metal coatings for electrodes
- Hydrophobic or hydrophilic ceramic layers