Tornado Compact LAB is a compact deposition system – a real lab workhorse, and due to the easy access, easy operation, and the high process repeatability, it is a preferred tool for both the young student, and the experienced scientist.

Tornado 405 Sputtering

• Up to 5 pcs 2-3” magnetrons
• Up to 3 pcs 4” magnetrons
• DC, pDC, RF, HiPIMS
• Single target or multi target co-deposition

Tornado 405 Thermal Evaporator

• Five thermal evaporators (flexible boat size)
• Two power supplies for sequential or co-evaporation

Tornado 306 Ebeam

• Metallization
• Lift-off processes
• Optionally combined with thermal evaporator

Single substrate stage

• Continuous 360° or indexed rotation
• Backside resistive heating up to 400°C
• Water cooled substrate stage with tilt (+/-45deg)
• Single substrate load lock
• Typical substrate size up to 4” (100mm)
• RF/DC Bias feeding

Batch substrate fixture

• Max diameter 300mm
• Wafer capacity: 8×3” (76,2mm), 5×4” (100mm)
• RF/DC Bias feeding

Application examples

• General thin film R&D
• Photovoltaic
• Multilayer ohmic contacts
• Oxide and nitride coatings
• Graded cermet layers
• Metal coatings for electrodes
• Hydrophobic or hydrophilic ceramic layers